REDONDO BEACH, Calif.--TRW Inc. here today announced an expanded agreement with the Extreme Ultraviolet Limited Liability Co. consortium to accelerate availability of EUV light sources for next-generation lithography. TRW said the new pact will enable it to make available lasers and related light-source technologies for EUV in 2003.
To meet the demand for EUV light sources and other products, TRW also said it was doubling the manufacturing capacity of its Cutting Edge subsidiary, which was acquired by the company in October.
Details about the new agreement were not released by TRW or the EUV LLC consortium, which has moved up its targets for early prototype systems. Earlier this year, the U.S.-based consortium--backed by Intel Corp., Motorola Inc., Advanced Micro Devices, and three U.S. national labs--announced an operational alpha tool and plans to accelerate development of 0.07-micron capability by the end of 2002 (see Feb. 27 story). However, questions remained about the ability of key components, including light sources.
TRW said the expanded agreement with the EUV LLC consortium will now enable it to develop EUV light sources with higher powers, increased efficiencies and higher throughput. These capabilities are needed in production systems.
"Since 1997, TRW has invested significant technical and capital resources to ensure EUV light sources will be available to semiconductor equipment manufacturers before chip makers reach the optical limits of existing light source technology," said Tom Romesser, vice president and general manager of TRW's Space & Technology Division. "We've developed kilowatt-class lasers and the conversion technology required to create EUV light.
"We've successfully demonstrated the feasibility of a high-power, laser-based EUV light source meeting our customers' needs," he said. "We've also ensured our ability to cost-effectively supply EUV light sources to the semiconductor industry by acquiring Cutting Edge Optronics, a solid-state laser and laser diode company."
